The 9th International Conference ALD FOR INDUSTRY will again bridge the gap between fundamental science, industrialization and commercialization of this technology. Atomic layer deposition (ALD) is a process for depositing a variety of thin film materials from the vapor phase of matter. The growth of this technology is not only based in microelectronics applications, but also in areas of industrial Li-Ion batteries, photovoltaics, optics, light, biomedicine and quantum technology.

This event is already established since 2017 and attracts annually more than 100 participants and numerous exhibitors to visit Dresden. The Conference with Tutorial provides the opportunity to learn more about fundamentals of ALD technology, to get informed about recent progress in the field and to get in contact with industrial and academic partners. Increase your visibility and present your company in our accompanying exhibition.

This time, the Conference will take place in Eindhoven, Netherlands. We thank our cooperation partners and look forward to a interactive and inspiring event in internationale atmosphere.

PREVIEW

• Tutorials
• International Conference
• Exhibition
• Poster Session

Confirmed Speakers

Paul de Bot, TSMC, Netherlands
Nils Boysen, Fraunhofer IMS, Germany
Rong Chen, HUST, China
Kauppinen Christoffer, VTT, Finland
Stefaan Decoutere, IMEC, Belgium
Charles Dezelah, ASM, Finland
Erwin Kessels, University Eindhoven, Netherlands
Martin Knaut, Technical University Dresden, Germany
Harm Knoops, Oxford Instruments Plasma Technology, Netherlands
Stephan Mingels, Bühler Alzenau GmbH, Germany
Alexander Perros, Beneq, Finland
Paul Poodt, Spark Nano, Netherlands
Bruce Rayner, Kurt Lesker, United Kingdom
Job Soethoudt, IMEC, Belgium
Sorin Stan, VDL Projects, Netherlands
Andreas Werbrouck, University Gent, Belgium
John West, Yole Group, France
Andreas Zienert, Fraunhofer ENAS, Germany