The 9th International Conference ALD FOR INDUSTRY will once again bridge the gap between fundamental science, industrialization, and commercialization of this technology. Atomic layer deposition (ALD) is a process for depositing a variety of thin-film materials from the vapor phase of matter. The growth of this technology is driven not only by microelectronics applications but also by applications in industrial Li-ion batteries, photovoltaics, optics, lighting, biomedicine, and quantum technology.

This event has been held annually since 2017 and attracts more than 100 participants and numerous exhibitors to Dresden each year. The conference and tutorial offer an opportunity to learn more about the fundamentals of ALD technology, stay informed about recent advances in the field, and network with partners from industry and academia. Boost your visibility and showcase your company at our accompanying exhibition.

This time, the conference will be held in Eindhoven, the Netherlands. We would like to thank our partners and look forward to an interactive and inspiring event in an international atmosphere.

PREVIEW

• Tutorials
• International Conference
• Exhibition
• Poster Session

Confirmed Speakers

Paul de Bot, TSMC, Netherlands
Nils Boysen, Fraunhofer IMS, Germany
Rong Chen, HUST, China
Christoffer Kauppinen, VTT, Finland
Stefaan Decoutere, IMEC, Belgium
Charles Dezelah, ASM, Finland
Erwin Kessels, Eindhoven University of Technology, Netherlands
Martin Knaut, Dresden University of Technology, Germany
Harm Knoops, Oxford Instruments Plasma Technology, Netherlands
Stephan Mingels, Bühler Alzenau GmbH, Germany
Alexander Perros, Beneq, Finland
Paul Poodt, Spark Nano, Netherlands
Bruce Rayner, Kurt Lesker, United Kingdom
Job Soethoudt, IMEC, Belgium
Sorin Stan, VDL Projects, Netherlands
Andreas Werbrouck, Ghent University, Belgium
John West, Yole Group, France
Andreas Zienert, Fraunhofer ENAS, Germany